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US Patent 10732516 Process robust overlay metrology based on optical scatterometry

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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=107325160
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Infobox
Is a
Patent
Patent
0
Patent Applicant
KLA-Tencor
KLA-Tencor
0
Current Assignee
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
107325160
Date of Patent
August 4, 2020
0
Patent Application Number
158619380
Date Filed
January 4, 2018
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=107325160
Patent Citations
‌
US Patent 10101670 Statistical model-based metrology
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US Patent 10152678 System, method and computer program product for combining raw data from multiple metrology tools
0
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US Patent 10190868 Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processing
0
‌
US Patent 10295342 System, method and computer program product for calibration of metrology tools
0
‌
US Patent 10325004 Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
0
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US Patent 10345095 Model based measurement systems with improved electromagnetic solver performance
0
‌
US Patent 10380728 Model-based metrology using images
0
‌
US Patent 10429320 Method for auto-learning tool matching
0
Patent Primary Examiner
‌
Gordon J Stock, Jr.
0
Edits on 8 Jun, 2022
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Infobox
Website URL
https://pdfpiw.uspto.gov/.piw?Docid=10732516
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Infobox (+17 properties)
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 US Patent 10732516 Process robust overlay metrology based on optical scatterometry

Infobox
Is a
Patent
Patent
Patent applicant
KLA-Tencor
KLA-Tencor
Current assignee
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10732516
Date of patent
August 4, 2020
Patent application number
15861938
Date Filed
January 4, 2018
Patent citations
‌
US Patent 10101670 Statistical model-based metrology
‌
US Patent 10152678 System, method and computer program product for combining raw data from multiple metrology tools
‌
US Patent 10190868 Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processing
‌
US Patent 10295342 System, method and computer program product for calibration of metrology tools
‌
US Patent 10325004 Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
‌
US Patent 10345095 Model based measurement systems with improved electromagnetic solver performance
‌
US Patent 10380728 Model-based metrology using images
‌
US Patent 10429320 Method for auto-learning tool matching
Patent primary examiner
‌
Gordon J Stock, Jr.

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