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US Patent 10734280 Integrated circuit devices and method of manufacturing the same

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Patent Citations Received
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US Patent 11855144 Source/drain metal contact and formation thereof
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US Patent 11837645 Method of manufacturing a semiconductor device
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=107342800
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Patent Citations Received
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US Patent 11637186 Field effect transistor having gate contact and source/drain contact separated by a gap
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US Patent 11631769 Semiconductor device
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US Patent 11538916 Semiconductor device
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=10734280
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 US Patent 10734280 Integrated circuit devices and method of manufacturing the same

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10734280
Date of patent
August 4, 2020
Patent application number
16154896
Date Filed
October 9, 2018
Patent citations
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US Patent 10141260 Interconnection structure and method for forming the same
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US Patent 10418280 Fabrication of self-aligned gate contacts and source/drain contacts directly above gate electrodes and source/drains
Patent primary examiner
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Allan R. Wilson

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