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US Patent 10741401 Self-aligned semiconductor gate cut
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Patent
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Date Filed
February 9, 2019
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Date of Patent
August 11, 2020
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Patent Application Number
16271803
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Patent Citations
US Patent 10153209 Insulating gate separation structure and methods of making same
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US Patent 10037993 Method of making a FinFET device
US Patent 10014298 Method of forming field effect transistors with replacement metal gates and contacts and resulting structure
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Patent Citations Received
US Patent 11908915 Method of manufacturing semiconductor devices and semiconductor devices
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US Patent 11563004 Semiconductor device and method for fabricating the same
US Patent 11342434 Method of manufacturing semiconductor devices and semiconductor devices
Patent Jurisdiction
United States Patent and Trademark Office
0
Patent Number
10741401
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Patent Primary Examiner
Zandra V. Smith
0
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