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US Patent 10741659 Semiconductor device
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Patent
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Date Filed
November 27, 2018
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Date of Patent
August 11, 2020
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Patent Application Number
16200730
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Patent Citations
US Patent 10181426 Etch profile control of polysilicon structures of semiconductor devices
Patent Citations Received
US Patent 12009411 Forming 3D transistors using 2D Van Der Waals materials
0
US Patent 11489064 Forming 3D transistors using 2D van per waals materials
US Patent 11488953 Semiconductor device having gate isolation layer
Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10741659
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Patent Primary Examiner
Nathan W Ha
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