US Patent 10804144 Deposition of aluminum oxide etch stop layers

Patent 10804144 was granted and assigned to Lam Research on October, 2020 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

Lam Research

Current Assignee

Lam Research

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

10804144

Date of Patent

October 13, 2020

Patent Application Number

16852119

Date Filed

April 17, 2020

Patent Citations

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US Patent 10418236 Composite dielectric interface layers for interconnect structures

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US Patent 10049869 Composite dielectric interface layers for interconnect structures

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US Patent 10665501 Deposition of Aluminum oxide etch stop layers

Patent Primary Examiner

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Brook Kebede

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