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US Patent 10818489 Atomic layer deposition of silicon carbon nitride based material

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United States Patent and Trademark Office

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Patent Number

Date of Patent

October 27, 2020

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Patent Application Number

167208630

Date Filed

December 19, 2019

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Patent Citations

US Patent 10208379 Synthesis and use of precursors for ALD of group VA element containing thin films

US Patent 10056249 Atomic layer deposition of antimony oxide films

US Patent 10049924 Selective formation of metallic films on metallic surfaces

Patent Primary Examiner

Savitri Mulpuri

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