US Patent 10910252 Plasma processing apparatus
Patent 10910252 was granted and assigned to Tokyo Electron on February, 2021 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
July 2, 2019
Date of Patent
February 2, 2021
Patent Applicant
Patent Application Number
16460055
Patent Citations
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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