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US Patent 10923380 Electrostatically clamped edge ring

Patent 10923380 was granted and assigned to Lam Research on February, 2021 by the United States Patent and Trademark Office.

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Patent abstract

An edge ring for use in a plasma processing chamber with a chuck is provided. An edge ring body has a first surface to be placed over and facing the chuck, wherein the first surface forms a ring around an aperture. A first elastomer ring is integrated to the first surface and extending around the aperture.

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