Patent attributes
A pathogen disinfection system includes a base and a pathogen disinfection apparatus having a UV light source disposed in the base and configured to emit UV light to at least partially inactivate pathogens exposed to the emitted UV light. Further, the system includes a beam shaping mechanism configured to shape a path of the emitted UV light so that the UV light is confined to a selected width, a first motion sensor configured to detect when an object or human being has moved into the UV light path and send a first signal in response to detecting such a movement, a proximity sensor configured to detect when a human being is present and send a second signal in response to detecting such a presence, and a controller to activate the UV light source after receiving the first signal and deactivating the UV light source after receiving the second signal.
