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US Patent 11003093 Process variability aware adaptive inspection and metrology
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Patent
Date Filed
November 26, 2019
Date of Patent
May 11, 2021
Patent Application Number
16696263
Patent Citations
US Patent 10755025 Process window identifier
US Patent 10627723 Yield estimation and control
US Patent 10859926 Methods for defect validation
US Patent 10514614 Process variability aware adaptive inspection and metrology
US Patent 10579772 Computational wafer inspection
Patent Citations Received
US Patent 12092965 Process variability aware adaptive inspection and metrology
0
US Patent 11635699 Determining pattern ranking based on measurement feedback from printed substrate
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11003093
Patent Primary Examiner
Phallaka Kik
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