US Patent 11035988 Tunable shrinkage process for manufacturing gratings

A manufacturing system performs a lithographic patterning of a resist formed on a substrate to create a first optical grating including a plurality of structures at a first slant angle relative to the substrate. The manufacturing system performs a tunable shrinkage of the plurality of structures to adjust the first slant angle to a target slant angle different from the first slant angle. In some embodiments, the manufacturing system performs a post-processing of the plurality of structures to create a second optical grating from the first optical grating. The post-processing may adjust at least one of: a refractive index, a height, and a volume of the first optical grating.