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US Patent 11036141 Photoresist and manufacturing method of photoresist patterns

Patent 11036141 was granted and assigned to BOE Technology Group Co., Ltd. on June, 2021 by the United States Patent and Trademark Office.

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Patent abstract

A photoresist and a method of manufacturing photoresist patterns are disclosed. The photoresist includes a plurality of photosensitive units, and each photosensitive unit has magnetism.

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