Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yu-Lin Yang0
Chen-Feng Hsu0
Tzu-Chiang Chen0
Wei-Sheng Yun0
Chao-Ching Cheng0
Date of Patent
June 22, 2021
0Patent Application Number
166577470
Date Filed
October 18, 2019
0Patent Citations
Patent Primary Examiner
Patent abstract
A semiconductor device and a method of manufacturing the same are disclosed. The semiconductor device includes semiconductor wires disposed over a substrate, a source/drain epitaxial layer in contact with the semiconductor wires, a gate dielectric layer disposed on and wrapping around each channel region of the semiconductor wires, a gate electrode layer disposed on the gate dielectric layer and wrapping around the each channel region, and dielectric spacers disposed in recesses formed toward the source/drain epitaxial layer.
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