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US Patent 11053590 Nozzle for uniform plasma processing

Patent 11053590 was granted and assigned to Applied Materials on July, 2021 by the United States Patent and Trademark Office.

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Is a

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Patent attributes

Patent Applicant

Applied Materials

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Current Assignee

Applied Materials

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Siva Suri Chandra Rao Bhesetti0

Sriskantharajah Thirunavukarasu0

Cheng Sun0

Eng Sheng Peh0

Rohit Mishra0

Shoju Vayyapron0

Date of Patent

July 6, 2021

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Patent Application Number

165847070

Date Filed

September 26, 2019

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Patent Citations Received

US Patent 11802341 PE-CVD apparatus and method

US Patent 11492698 Optically transparent pedestal for fluidly supporting a substrate

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Patent Primary Examiner

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Patent abstract

A nozzle for uniform plasma processing comprises an inlet portion and an outlet portion. The inlet portion has a side surface substantially parallel to a vertical axis. The inlet portion comprises a plurality of gas channels. The outlet portion is coupled to the inlet portion. The outlet portion comprises a plurality of outlets. At least one of the outlets is at an angle other than a right angle relative to the vertical axis.

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