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US Patent 11056426 Metallization interconnect structure formation
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Patent
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Date Filed
May 29, 2019
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Date of Patent
July 6, 2021
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Patent Application Number
16425524
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Patent Citations
US Patent 10121754 Interconnect structures and methods for fabricating interconnect structures
US Patent 10181420 Devices with chamfer-less vias multi-patterning and methods for forming chamfer-less vias
US Patent 10020254 Integration of super via structure in BEOL
Patent Citations Received
US Patent 11600519 Skip-via proximity interconnect
Patent Inventor Names
Chih-Chao Yang
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Hosadurga Shobha
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Hsueh-Chung Chen
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Yann Mignot
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11056426
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Patent Primary Examiner
Luan C Thai
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