Patent attributes
The present disclosure may be embodied as a method for creating a restriction pattern from a mask material having a strain (εmask) an for mapping elastomeric membrane having a strain (εmembrane) into a target 3D shape. The method may include discretizing the target 3D shape into a plurality of radial segments, and a radial strain (εr) is determined for each radial position (r) on each radial segment of the plurality of radial segments. A restriction pattern is determined, wherein the restriction pattern comprises a quantity of mask material for each position r to provide a composite strain (εmask, εsilicone). In some embodiments, the method further includes depositing a first membrane layer into a mold and placing mask material into the first membrane layer according to the determined restriction pattern. The first membrane layer is cured.
