Patent 11088190 was granted and assigned to Hamamatsu Photonics on August, 2021 by the United States Patent and Trademark Office.
An optical semiconductor device includes a semiconductor substrate having a plurality of photoelectric conversion parts and having a trench formed to separate the plurality of photoelectric conversion parts from each other, an insulating layer formed on at least an inner surface of the trench, a boron layer formed on the insulating layer, and a metal layer formed on the boron layer.