US Patent 11124867 Gradient material layer and method for manufacturing the same

Patent 11124867 was granted and assigned to National Taiwan University of Science and Technology on September, 2021 by the United States Patent and Trademark Office.

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Patent Applicant

National Taiwan University of Science and Technology

Current Assignee

National Taiwan University of Science and Technology

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

11124867

Date of Patent

September 21, 2021

Patent Application Number

20200313

Date Filed

March 13, 2020

Patent abstract

The present invention provides a gradient material layer and a method for manufacturing the same. The gradient material layer has a base-material region, a diffusion region, and a compound region, wherein the diffusion region is located between the base-material region and the compound region. The base-material region includes a metal material. The diffusion region doped with nitrogen includes the metal material. The compound region includes metal nitride. The nitrogen content of the compound region is greater than that of the diffusion region.

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