Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Xu Haiyang0
Hidetatsu Isokawa0
Koji Maeda0
Shun Ehara0
Date of Patent
November 16, 2021
0Patent Application Number
164103780
Date Filed
May 13, 2019
0Patent Primary Examiner
Patent abstract
A mechanism that conveys a substrate is cleaned in a cleaning unit. A substrate processing apparatus that includes a substrate polishing device and a substrate cleaning unit is disclosed. The substrate cleaning unit includes a cleaning module and a cleaning unit conveyance mechanism. The cleaning unit conveyance mechanism includes a hand and a hand open/close mechanism. The substrate processing apparatus further includes a hand cleaning unit. The hand cleaning unit includes a hand cleaning tank and a cleaning liquid injection mechanism.
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