Patent attributes
A flow control apparatus includes a plasma actuator, a storage device, and a control circuit. The plasma actuator causes discharge in a discharge area by applying an alternating-current (AC) voltage between electrodes to form an induced flow of gas. The electrodes are shifted relatively to each other with a dielectric disposed between them. The storage device stores a changing condition of an AC voltage waveform for changing a gas flow state formed in a flow control area of gas from a first state to a second state by adding the induced flow of gas. The control circuit refers to the changing condition of the AC voltage waveform and control the AC voltage waveform based on the changing condition of the AC voltage waveform, in a case of changing the gas flow state formed in the gas flow control area from the first flow state to the second flow state.
