Is a
Patent attributes
Patent Applicant
Patent Jurisdiction
Patent Number
Date of Patent
November 16, 2021
Patent Application Number
16420725
Date Filed
May 23, 2019
Patent Primary Examiner
Patent abstract
In a substrate processing method, a cleaning process is performed at a first temperature to remove a portion of a cumulative layer that is deposited within a chamber by deposition processes (step 1). The deposition processes are performed at the first temperature on a plurality of substrates within the chamber respectively (step 2). The step 1 and the step 2 are performed alternately and repeatedly.
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