Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 16, 2021
Patent Application Number
16065873
Date Filed
December 20, 2016
Patent Primary Examiner
Patent abstract
This disclosure relates to a photosensitive stacked structure that includes first and second layers, in which the first layer is a photosensitive, dielectric layer and the second layer is a photosensitive layer. The dissolution rate of the first layer in a developer is less than the dissolution rate of the second layer in the developer.
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