Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Che-Cheng Chang0
Chih-Han Lin0
Horng-Huei Tseng0
Date of Patent
November 16, 2021
0Patent Application Number
168834860
Date Filed
May 26, 2020
0Patent Citations Received
Patent Primary Examiner
Patent abstract
An embodiment is a method including forming a multi-layer stack over a substrate, the multi-layer stack including alternating first layers and second layers, patterning the multi-layer stack to form a fin, forming an isolation region surrounding the fin, an upper portion of the fin extending above a top surface of the isolation region, forming a gate stack on sidewalls and a top surface of the upper portion of the fin, the gate stack defining a channel region of the fin, and removing the first layers from the fin outside of the gate stack, where after the removing the first layers, the channel region of the fin includes both the first layers and the second layers.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.