US Patent 11186732 Vertically-aligned carbon nanotube substrate having increased surface area

A method for manufacturing a vertically aligned carbon nanotube substrate includes the steps of treating a vertically aligned carbon nanotube array in an untreated state with a plasma to generate a vertically aligned carbon nanotube array in a plasma-treated state and adhering a coating onto at least a portion of the vertically aligned carbon nanotube array in the plasma-treated state to generate a vertically aligned carbon nanotube array in a coated state. The step of treating can include exposing the vertically aligned carbon nanotube substrate in the untreated state to the plasma in a plasma chamber. The step of adhering can include using a process of thermal evaporation or e-beam ablation. The method can also include the step of adhering a plurality of fluorophores to at least a portion of the vertically aligned carbon nanotube array in the coated state.