Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 30, 2021
Patent Application Number
16736813
Date Filed
January 8, 2020
Patent Primary Examiner
Patent abstract
A semiconductor device includes a gate electrode, a semiconductor film, and a conductive film. The semiconductor film includes an oxide semiconductor material. The semiconductor film includes a channel region, a low-resistance region, and an intermediate region. The channel region is opposed to the gate electrode. The low-resistance region has a lower electric resistance than the channel region. The intermediate region is provided between the low-resistance region and the channel region. The conductive film is provided selectively in contact with the low-resistance region of the semiconductor film.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.