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US Patent 11207758 Printing a chemical mechanical polishing pad

Patent 11207758 was granted and assigned to Applied Materials on December, 2021 by the United States Patent and Trademark Office.

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Patent abstract

A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.

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