US Patent 11238189 Process window optimizer
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Patent abstract
A defect prediction method for a device manufacturing process involving processing a pattern onto a substrate, the method comprising: identifying a processing window limiting pattern (PWLP) from the pattern; determining a processing parameter under which the PWLP is processed; and determining or predicting, using the processing parameter, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the PWLP with the device manufacturing process.
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Patent Inventor Names
Stefan Hunsche0
Venugopal Vellanki0
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Patent Number
112381890
Date of Patent
February 1, 2022
0Patent Application Number
159968990
Date Filed
June 4, 2018
0Official Website
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US Patent 11238189 Process window optimizer
Infobox
Is a
Patent jurisdiction
Patent number
11238189
Date of patent
February 1, 2022
Patent application number
15996899
Date Filed
June 4, 2018
Patent primary examiner
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