US Patent 11257824 Memory device and method for forming thereof

A semiconductor device includes a plurality of first memory cells in a memory region and a first cut-off transistor in a dummy region, the dummy region being adjacent to the memory region. Each of the plurality of the first memory cells includes a static random access memory (SRAM) cell. The static random access memory cell includes a first pull-down transistor and a second pull-down transistor. The plurality of the first memory cells includes a first memory cell. A first source/drain region of the first pull-down transistor in the first memory cell is electrically coupled to a first source/drain region of the first cut-off transistor and a second source/drain region of the first cut-off transistor is electrically coupled to a power supply voltage.