Patent 11263496 was granted and assigned to D2S Inc. on March, 2022 by the United States Patent and Trademark Office.
Methods for matching features in patterns for electronic designs include inputting a set of pattern data for semiconductor or flat panel displays, where the set of pattern data comprises a plurality of features. Each feature in the plurality of features is classified, where the classifying is based on a geometrical context defined by shapes in a region. The classifying uses machine learning techniques.