Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
March 15, 2022
Patent Application Number
16982191
Date Filed
June 18, 2019
Patent Citations Received
Patent Primary Examiner
A plasma etching method using a Faraday cage which is capable of inhibiting the formation of a needle-like structure and forming a pattern portion having a depth gradient on an etching base.
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