Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 29, 2022
Patent Application Number
16861144
Date Filed
April 28, 2020
Patent Citations
Patent Primary Examiner
A method for reforming an amorphous carbon film as part of a deposition process thereof, includes process of: (i) depositing an amorphous carbon film on a substrate in a reaction space until a thickness of the amorphous carbon film reaches a predetermined thickness, and then stopping the deposition process; and (ii) exposing the amorphous carbon film to an Ar and/or He plasma in an atmosphere substantially devoid of hydrogen, oxygen, and nitrogen.
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