US Patent 11307357 Overcoating slanted surface-relief structures using atomic layer deposition

Techniques for overcoating slanted structures and devices obtained using the techniques are disclosed. In some embodiments, a method of forming an overcoat layer on a surface-relief structure on a substrate includes receiving the substrate with the surface-relief structure. The surface-relief structure includes a plurality of ridges slanted with respect to the substrate, and a plurality of grooves each between two adjacent ridges. The method further includes depositing, in each cycle of a plurality of cycles, a uniform layer of an overcoat material on surfaces of the plurality of ridges and bottoms of the plurality of grooves. The deposited layers of the overcoat material and the plurality of ridges collectively form a light-coupling structure on the substrate. A surface of the overcoat layer is planar.