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US Patent 11313809 Process control metrology

Overview Structured Data Issues Contributors Activity

Is a

Current Assignee

Date Filed

May 4, 2017

Date of Patent

April 26, 2022

Patent Applicant

Patent Application Number

15587297

Patent Citations

US Patent 10151986 Signal response metrology based on measurements of proxy structures

US Patent 10210606 Signal response metrology for image based and scatterometry overlay measurements

US Patent 10215693 Infrared spectroscopic reflectometer for measurement of high aspect ratio structures

US Patent 10324050 Measurement system optimization for X-ray based metrology

US Patent 10352876 Signal response metrology for scatterometry based overlay measurements

US Patent 10281263 Critical dimension measurements with gaseous adsorption

US Patent 10041873 Porosity measurement of semiconductor structures

US Patent 10072921 Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element

US Patent 10101676 Spectroscopic beam profile overlay metrology

US Patent 10132684 Reflectometer, spectrophometer, ellipsometer and polarimeter system with a super continuum laser-source of a beam of electromagnetism and improved detector system

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Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

Mohamed K Amara

CPC Code

G01N 2021/95615

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