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US Patent 11315830 Metallic interconnect structures with wrap around capping layers
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Patent
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Date Filed
January 15, 2020
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Date of Patent
April 26, 2022
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Patent Application Number
16743115
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Patent Citations
US Patent 10177028 Method for manufacturing fully aligned via structures having relaxed gapfills
US Patent 10741397 Liner planarization-free process flow for fabricating metallic interconnect structures
US Patent 10002831 Selective and non-selective barrier layer wet removal
US Patent 10431464 Liner planarization-free process flow for fabricating metallic interconnect structures
Patent Inventor Names
Cornelius Brown Peethala
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Theo Standaert
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Kedari Matam
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Chih-Chao Yang
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11315830
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Patent Primary Examiner
Benjamin Tzu-Hung Liu
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CPC Code
H01L 21/76852
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H01L 21/76856
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H01L 21/76877
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H01L 21/76883
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H01L 23/5226
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H01L 21/7684
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H01L 23/5329
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H01L 21/76885
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H01L 21/76834
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H01L 21/76802
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