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US Patent 11319513 Non-aqueous tungsten compatible metal nitride selective etchants and cleaners

Patent 11319513 was granted and assigned to Avantor Performance Materials, Inc. on May, 2022 by the United States Patent and Trademark Office.

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Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.

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