Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Nicholas Joy0
Angelique Raley0
Date of Patent
May 3, 2022
0Patent Application Number
168701210
Date Filed
May 8, 2020
0Patent Citations
Patent Primary Examiner
CPC Code
In accordance with an embodiment, a method of plasma processing includes etching a refractory metal by flowing oxygen into a plasma processing chamber, intermittently flowing a passivation gas into the plasma processing chamber, and supplying power to sustain a plasma in the plasma processing chamber.
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