US Patent 11329089 Image sensor with multi-patterned isolation well
Patent 11329089 was granted and assigned to Gigajot Technology Inc. on May, 2022 by the United States Patent and Trademark Office.
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Patent Inventor Names
Jiaju Ma0
Edits on 26 Sep, 2022
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
113290890
Date of Patent
May 10, 2022
0Patent Application Number
168948310
Date Filed
June 7, 2020
0Patent Primary Examiner
Edits on 24 Sep, 2022
Golden AI
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US Patent 11329089 Image sensor with multi-patterned isolation well
Article
Pixel isolation wells in a semiconductor image sensor are implemented via two or more photoresist patterning phases and two or more corresponding dopant implantation operations. A distinct photomask is applied in each patterning phase with the isolation-well street lines patterned by each mask spaced from one another by an integer multiple (i.e., 2 or greater) of the pixel pitch, and patterns formed by respective masks being staggered by the pixel pitch.
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
11329089
Date of patent
May 10, 2022
Patent application number
16894831
Date Filed
June 7, 2020
Patent primary examiner
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