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US Patent 11353845 Model-adaptive multi-source large-scale mask projection 3D printing system

Patent 11353845 was granted and assigned to Beijing University of Technology on June, 2022 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
Beijing University of Technology
Beijing University of Technology
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Current Assignee
Beijing University of Technology
Beijing University of Technology
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
113538450
Patent Inventor Names
Ziming Zhang0
Zechao Liu0
Xiaohua Guo0
Meng Jian0
Lifang Wu0
Lidong Zhao0
Jiankang Qiu0
Date of Patent
June 7, 2022
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Patent Application Number
170027720
Date Filed
August 25, 2020
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Patent Citations
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US Patent 10759110 Light homogenization method for multi-source large-scale surface exposure 3D printing
Patent Primary Examiner
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Gandhi Thirugnanam
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CPC Code
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G06T 15/50
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G06T 15/10
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H04N 1/024
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G06T 15/00
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B29C 64/393
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B29C 64/291
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B29C 64/129
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G06T 15/04
0
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A model-adaptive multi-source large-scale mask projection 3D printing system configured to conduct the following steps: projecting pure-color images of first and second colors having identical attributes, capturing an image of an overlapping portion and calculating height and width information of the overlapping portion; splitting a pre-processed slice and respectively recording width and height information of two slices resulting from the splitting and generating two gray scale images having identical attributes thereto; counting power values of identical positions of slices in different gray scale values, performing a further calculation to obtain a projection mapping function, using the projection mapping function as a basis for performing optimization on gray scale interpolation of the generated images; and fusing the processed gray scale images and the originally split two slices to obtain a mask projection 3D printing slice having a uniform shaping brightness, and forming a final product.

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