Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chih-Chien Chi0
Chen-Yuan Kao0
Yao-Jen Chang0
Po-Cheng Shih0
Kai-Shiang Kuo0
Jun-Yi Ruan0
Hung-Wen Su0
Date of Patent
June 28, 2022
Patent Application Number
16939199
Date Filed
July 27, 2020
Patent Citations
Patent Citations Received
Patent Primary Examiner
A device, structure, and method are provided whereby an insert layer is utilized to provide additional support for weaker and softer dielectric layer. The insert layer may be applied between two weaker dielectric layers or the insert layer may be used with a single layer of dielectric material. Once formed, trenches and vias are formed within the composite layers, and the insert layer will help to provide support that will limit or eliminate undesired bending or other structural motions that could hamper subsequent process steps, such as filling the trenches and vias with conductive material.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.