Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 12, 2022
Patent Application Number
16806211
Date Filed
March 2, 2020
Patent Citations
Patent Primary Examiner
In a manufacturing process of a transistor including an oxide semiconductor film, oxygen doping treatment is performed on the oxide semiconductor film, and then heat treatment is performed on the oxide semiconductor film and an aluminum oxide film provided over the oxide semiconductor film. Consequently, an oxide semiconductor film which includes a region containing more oxygen than a stoichiometric composition is formed. The transistor formed using the oxide semiconductor film can have high reliability because the amount of change in the threshold voltage of the transistor by a bias-temperature stress test (BT test) is reduced.
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