US Patent 11398480 Transistor having forked nanosheets with wraparound contacts

A fork-sheet semiconductor device includes a first-type source/drain region on a substrate and a second-type source/drain region on the substrate and separated from the first-type source/drain region by an insulator pillar. The fork-sheet semiconductor device further includes a first metal portion and a second metal portion. The first metal portion completely covers a first upper surface and a first exposed sidewall the first-type source/drain region and the second metal portion completely covers a second upper surface and a second exposed sidewall the second-type source/drain region. The first and second metal portions are separated from one another by the insulator pillar. A first-type contact portion extends vertically from the first metal portion and an opposing second-type contact portion extends vertically from the second metal portion. A first upper interconnect structure contacts the first-type contact portion and a second upper interconnect structure contacts the second-type contact portion.