Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tsung-Hsuan Hong0
Chih-Nan Wu0
Chun Che Lin0
Shiu-Ko JangJian0
Date of Patent
August 2, 2022
0Patent Application Number
169335510
Date Filed
July 20, 2020
0Patent Citations
Patent Primary Examiner
An integrated circuit structure includes a dielectric layer and an etch stop layer. The etch stop layer includes a first sub layer including a metal nitride over the first dielectric layer, and a second sub layer overlying or underlying the first sub layer. The second sub layer includes a metal compound comprising an element selected from carbon and oxygen, and is in contact with the first sub layer.
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