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US Patent 11415890 Method of mask data synthesis and mask making
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Patent
Date Filed
March 8, 2021
Date of Patent
August 16, 2022
Patent Application Number
17195469
Patent Citations
US Patent 10460071 Shaped beam lithography including temperature effects
Patent Citations Received
US Patent 11947254 Method of mask data synthesis and mask making
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11415890
Patent Primary Examiner
Christopher G Young
CPC Code
G03F 1/36
G03F 1/78
G03F 7/2061
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