US Patent 11440683 Device and method for regulating a gas flow rate

Device and method for regulating a flow rate of gas intended to supply a propulsion apparatus for a spacecraft comprising xenon tank, a circuit comprising a withdrawing pipe having an upstream end connected to the tank and a downstream end connected to a propulsion member, the withdrawing pipe comprising an isolation first valve, a regulating second valve and a member for measuring the pressure downstream of the regulating second valve. The regulating second valve regulates the flow rate and/or the determined pressure according to the pressure measured. The regulating second valve is a proportional valve of electrically operated variable throughout PCV type.