Patent attributes
A disclosed control system for a gas assisted plunger lift (GAPL) system includes a sensor and a processor circuit. The sensor is configured to measure a plunger speed and/or velocity and the processor circuit is configured to control various parameters of the GAPL based on the measured plunger speed and/or velocity. The processor circuit may be configured to adjust a gas injection rate parameter based on the measured plunger speed and/or velocity, and/or may adjust one or more parameters including: a close time, an afterflow time, a flow rate, a load factor, a tubing pressure, a casing pressure, and a tubing/casing differential pressure. The controller may be further configured to adjust all parameters simultaneously or may sequentially adjust a first sub-set of parameters and then adjust a second sub-set of parameters. The first sub-set may include a gas injection flow rate and the second sub-set may include after-flow and close time parameters.
