Patent attributes
In one example, a method includes instructing, by a processing system of a distance sensor, a pattern projector of the distance sensor to project a pattern of light onto an object, wherein the pattern comprises a plurality projection artifacts, detecting, by the processing system, a location of a first projection artifact of the plurality of artifacts in an image of the object that includes the pattern of light, wherein the detecting comprises identifying an area of peak light intensity within a window corresponding to a trajectory of the first projection artifact, wherein the trajectory represents a range of potential movement of the first projection artifact on an imaging sensor of the distance sensor, and calculating, by the processing system, a distance from the distance sensor to the object based in part on the location of the first projection artifact.
