Patent attributes
An exhaust gas purification device includes a substrate including an upstream end and a downstream end and having a length Ls; a first containing Pd particles, extending between the upstream end and a first position, and being in contact with the substrate; a second containing Rh particles, extending between the downstream end and a second position, and being in contact with the substrate; and a third catalyst layer containing Rh particles, extending between the upstream end and a third position, and being in contact with at least the first catalyst layer, wherein an average of a Rh particle size distribution is from 1.0 to 2.0 nm, and a standard deviation of the Rh particle size distribution is 0.8 nm or less in each of the second catalyst layer and the third catalyst layer.
