Patent 11543704 was granted and assigned to Beam Engineering For Advanced Measurements Co. on January, 2023 by the United States Patent and Trademark Office.
Methods, materials, systems, and devices for stabilizing photoalignment patterns in liquid crystal diffractive waveplates (LCDWs) against radiation, mechanical, and electrical influences by creating a polymer network within the bulk of LCDW such as the polymer network does not affect the LC orientation pattern in the bulk of the DW and does not result in residual retardation and light scattering while being able to fast switching and relaxation with no haze at application of electric fields.