Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 3, 2023
Patent Application Number
17188064
Date Filed
March 1, 2021
Patent Citations
Patent Primary Examiner
An upper electrode used for a substrate processing apparatus using plasma is provided. The upper electrode includes a bottom surface including a center region and an edge region having a ring shape and surrounding the center region, a first protrusion portion protruding toward plasma from the edge region and having a ring shape, wherein the first protrusion portion includes a first apex corresponding to a radial local maximum point toward the plasma, and a first distance, which is a radial-direction distance between the first apex and a center axis of the upper electrode, is greater than a radius of a substrate.
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