Patent attributes
A system for conditioning a gas includes an inlet configured to receive the gas from a gas source. The system also includes a strainer downstream from the inlet. The strainer is configured to remove debris from the gas. The system also includes a first flowpath downstream from the strainer. The first flowpath includes a first pressure regulator that is configured to regulate a pressure of the gas by a first amount. The system also includes a second flowpath downstream from the strainer. The first and second flowpaths are parallel. The second flowpath includes a second pressure regulator that is configured to regulate the pressure of the gas by a second amount. The system also includes one or more flowpath valves downstream from the strainer and upstream from the first pressure regulator, the second pressure regulator, or both.
